Fabrications of GaAs quantum dots by modified droplet epitaxy

Citation
K. Watanabe et al., Fabrications of GaAs quantum dots by modified droplet epitaxy, JPN J A P 2, 39(2A), 2000, pp. L79-L81
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
39
Issue
2A
Year of publication
2000
Pages
L79 - L81
Database
ISI
SICI code
Abstract
We propose a modified droplet epitaxy method for fabricating self-organized GaAS/AlGaAs quantum dots (QDs) with a high As flux irradiation and a low s ubstrate temperature. By our novel method, GaAs QDs were successfully forme d, retaining their pyramidal shape; original base size and density of dropl ets, and preventing layer-by-layer growth. Quantum size effects of the QDs were distinctly observed by photoluminescence measurements. It was confirme d that this new modified droplet epitaxy method is promising for fabricatin g a high-quality GaAs/AlGaAs QD system.