Does normal boiling exist due to laser-pulse or ion bombardment?

Citation
R. Kelly et A. Miotello, Does normal boiling exist due to laser-pulse or ion bombardment?, J APPL PHYS, 87(6), 2000, pp. 3177-3179
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
6
Year of publication
2000
Pages
3177 - 3179
Database
ISI
SICI code
0021-8979(20000315)87:6<3177:DNBEDT>2.0.ZU;2-K
Abstract
We consider here the process of normal boiling as induced by laser-pulse or ion bombardment. Normal boiling (thenceforth "boiling") refers to the appe arance of heterogeneously nucleated bubbles which diffuse towards the outer surface of a liquid and, if the surface is reached, may possibly escape. W e will here present evidence that boiling, whether the distance scale is at omically small (5-15 nm, as for laser-pulse or ion impact on a metal in the absence of thermal diffusion) or much larger, has a prohibitive kinetic ob stacle because it requires bubble diffusion. That is to say: boiling will n ever be a significant process for bombardment with laser pulses which are s hort (< 1 mu s) or with ions in general. This leaves vaporization and phase explosion as the only possible thermal-spike processes capable of expellin g material from a laser-pulse or ion bombarded surface in a significant qua ntity. (C) 2000 American Institute of Physics. [S0021-8979(00)03006-1].