5 '-nicked apurinic/apyrimidinic sites are resistant to beta-elimination by beta-polymerase and are persistent in human cultured cells after oxidative stress
J. Nakamura et al., 5 '-nicked apurinic/apyrimidinic sites are resistant to beta-elimination by beta-polymerase and are persistent in human cultured cells after oxidative stress, J BIOL CHEM, 275(8), 2000, pp. 5323-5328
Genomic DNA is continuously exposed to oxidative stress. Whereas reactive o
xygen species (ROS) preferentially react with bases in DNA, free radicals a
lso abstract hydrogen atoms from deoxyribose, resulting in the formation of
apurinic/apyrimidinic (AP) sites and strand breaks. We recently reported h
igh steady-state levels of AP sites in rat tissues and human liver DNA (Nak
amura, J., and Swenberg, J. A. (1999) Cancer Res. 59, 2522-2526), These AP
sites were predominantly cleaved 5' to the lesion. We hypothesized that the
se endogenous AP sites were derived from oxidative stress. In this investig
ation, AP sites induced by ROS were quantitated and characterized. A combin
ation of H2O2 and FeSO4 induced significant numbers of AP sites in calf thy
mus DNA, which were predominantly cleaved 5' to the AP sites (75%) of total
aldehydic AP sites). An increase in the number of 5'-AP sites was also det
ected in human cultured cells exposed to H2O2, and these 5'-AP sites were p
ersistent during the post-exposure period. beta-Elimination by DNA beta-pol
ymerase efficiently excised 5'-regular AP sites, but not 5'-AP sites, in DN
A from cells exposed to H2O2. These results suggest that 5'-oxidized AP sit
es induced by ROS are not efficiently repaired by the mammalian short patch
base excision repair pathway.