Dimethylhydrazine and tertiarybutylhydrazine were used as nitrogen sources
in the metalorganic vapour-phase epitaxy of ZnSe:N/GaAs epilayers grown at
typically 345 degrees C. Both compounds release reactive NH2 species in the
rmal decomposition well below growth temperature and induce efficient nitro
gen incorporation. The achievement of high net acceptor concentrations is p
resently limited by residual donor impurities in the employed source materi
als. (C) 2000 Elsevier Science B.V. All rights reserved.