Nitrogen doping of MOVPE-grown ZnSe by hydrazine derivatives

Citation
Uw. Pohl et al., Nitrogen doping of MOVPE-grown ZnSe by hydrazine derivatives, J CRYST GR, 209(4), 2000, pp. 683-686
Citations number
18
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
209
Issue
4
Year of publication
2000
Pages
683 - 686
Database
ISI
SICI code
0022-0248(200002)209:4<683:NDOMZB>2.0.ZU;2-8
Abstract
Dimethylhydrazine and tertiarybutylhydrazine were used as nitrogen sources in the metalorganic vapour-phase epitaxy of ZnSe:N/GaAs epilayers grown at typically 345 degrees C. Both compounds release reactive NH2 species in the rmal decomposition well below growth temperature and induce efficient nitro gen incorporation. The achievement of high net acceptor concentrations is p resently limited by residual donor impurities in the employed source materi als. (C) 2000 Elsevier Science B.V. All rights reserved.