Characterization of poly(methylphenylsilane) prepared by plasma polymerization

Poly(methylphenylsilane) plasma polymer layers of the thickness ranging fro m 10(-2) to 10(0) mu m intended to engineer interphases in glass fibre rein forced polymer composites and light-emitting displays were prepared by r.f. glow discharge technique. The films synthesized fi om a mixture of dichlor o(methyl)phenylsilane vapor and gaseous hydrogen were deposited on flat gla ss and silicon substrates and glass fibres as well. Deposition conditions w ere optimized to obtain required thickness, mechanical and electrical prope rties of interphases. Prepared layers were amorphous, relatively rigid and transparent at room temperature with excellent adhesion to substrates. The surface of plasma polymer is rough with isolated (silicon substrate) and co nglomerate (glass substrate) grains. FTIR and XPS spectra revealed a great amount of atomic oxygen bound to silicon atoms and enabled to determine the atomic concentrations. The structure model is proposed assuming a carbosil oxane network with not-crosslinked methyl and phenyl groups.