Interaction of gold with dislocations in silicon

Citation
B. Pichaud et al., Interaction of gold with dislocations in silicon, MAT SCI E B, 71, 2000, pp. 272-275
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
71
Year of publication
2000
Pages
272 - 275
Database
ISI
SICI code
0921-5107(20000214)71:<272:IOGWDI>2.0.ZU;2-Y
Abstract
Dislocation-gold interactions in FZ p-Si were studied both by Deep Level Tr ansient Spectroscopy (DLTS) and Electron Beam Induced Current (EBIC). It is shown that they are rather complex processes including direct and indirect interactions. The first one consists in gettering of gold with a formation of precipitates at dislocations inducing a depletion region around them. T he second one consists in gold redistribution determined by an enhancement of self-interstitial annihilation, which in turn stimulates the kick-out re action in regions adjacent to dislocations. The final gold distribution is a result of the competition between these two processes and is shown to dep end on annealing and cooling conditions. (C) 2000 Elsevier Science S.A. All rights reserved.