High pressure photoluminescence studies of carbon-induced germanium quantum dots grown on Si

Citation
Zx. Liu et al., High pressure photoluminescence studies of carbon-induced germanium quantum dots grown on Si, SEMIC SCI T, 15(2), 2000, pp. 155-159
Citations number
27
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
15
Issue
2
Year of publication
2000
Pages
155 - 159
Database
ISI
SICI code
0268-1242(200002)15:2<155:HPPSOC>2.0.ZU;2-6
Abstract
We have performed photoluminescence (PL) investigations on a 0.2 monolayer C and a 0.2 monolayer C/1.84 monolayer Ge quantum dot (QD) structure sandwi ched between Si layers. The dependence of the PL on hydrostatic pressure up to 12 GPa and laser excitation intensity ranging from 300 to 3000 W cm(-2) has been studied at 10 K. The no-phonon PL peak and its transverse optic p honon replica in both the structures shift to low energies with increasing pressure. This indicates that the electrons are confined to the Delta(2) co nduction bands of Si in both these structures. With increasing laser excita tion intensity, the PL transitions in the Si1-yCy quantum well remain at th e same energy whereas a significant blue shift is seen in the energy of the no-phonon PL line and its transverse optic phonon replica in the carbon-in duced Ge QDs. This behaviour is interpreted as evidence for type-I band ali gnment in the Si1-yCy quantum well and a staggered type-II band alignment i n C-induced Ge QDs.