Photocurrent spectroscopy of GaN and AlGaN epilayers grown on 6H (0001) silicon carbide

Citation
M. Devittorio et al., Photocurrent spectroscopy of GaN and AlGaN epilayers grown on 6H (0001) silicon carbide, SOL ST ELEC, 44(3), 2000, pp. 465-470
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
3
Year of publication
2000
Pages
465 - 470
Database
ISI
SICI code
0038-1101(200003)44:3<465:PSOGAA>2.0.ZU;2-E
Abstract
We have investigated the photocurrent of GaN and AlGaN epilayers grown on S iC substrates. The peculiar temperature and intensity dependence of the exc iton photocurrent reveal the existence of two different carrier localizatio n mechanisms, one due to shallow point defects, which is thermally activate d above 150 K and the other due to extended defects, which causes the subli near intensity dependence of the photocurrent in the whole temperature rang e comprised between 10 and 300 K. Comparison with temperature dependent pho toluminescence experiments suggests that Ga-vacancies can be responsible fo r the observed localization at point defects, whereas the high-density of n ative extended defects (as inferred by Rutherford back-scattering experimen ts) is responsible for the intensity dependence of the photocurrent. Howeve r they are localized close to the interface and do not propagate across the bulk of the layer resulting in a good quality of the sample. (C) 2000 Else vier Science Ltd. All rights reserved.