Photoluminescence of n-i-n GaAs/AlAs single quantum well structures under electric field bias

Citation
Lj. Olafsen et al., Photoluminescence of n-i-n GaAs/AlAs single quantum well structures under electric field bias, SUPERLATT M, 27(1), 2000, pp. 39-51
Citations number
35
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SUPERLATTICES AND MICROSTRUCTURES
ISSN journal
07496036 → ACNP
Volume
27
Issue
1
Year of publication
2000
Pages
39 - 51
Database
ISI
SICI code
0749-6036(200001)27:1<39:PONGSQ>2.0.ZU;2-G
Abstract
GaAs/AlAs single quantum well structures designed with well thickness near the type I/type-II crossover show distinctive photoluminescence peaks corre sponding to both type-I and type-II recombinations. Photoluminescence measu rements asa function of applied electric field and temperature ranging from 23 to 180 K and current-voltage measurements are presented for two MBE-gro wn structures clad with Si-doped Alq(0.45)Ga(0.55)As layers on n(+)-GaAs [ 100] substrates. The large and field-dependent energy separation between ty pe-I and type-II luminescence peaks is understood to arise from the build-u p of electrons at the X point in the AlAs barrier. (C) 2000 Academic Press.