Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire

Citation
Hc. Mu et al., Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire, SURF COAT, 124(1), 2000, pp. 61-65
Citations number
17
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
124
Issue
1
Year of publication
2000
Pages
61 - 65
Database
ISI
SICI code
0257-8972(20000201)124:1<61:LEIBAD>2.0.ZU;2-J
Abstract
(001) oriented yttria-stabilized zirconia (YSZ) and CeO2/YSZ multilayer fil ms with high in-plane biaxial texture have been deposited on an r-plane sap phire substrate by ion beam assisted deposition (IBAD) at ambient temperatu re. The optimal in-plane texture, whose full width at half maximum (FWHM) o f X-ray (111) phi-scan peak were 15 degrees and 12 degrees for YSZ and CeO2 /YSZ films respectively, could be obtained. Monte Carlo simulation results suggest that the divergence of incident bombarding ion beam is expected to have strong influence on film in-plane biaxial texture. The effect of the c ollimation of incident bombarding ion beam on the formation of high in-plan e biaxial texture was demonstrated under certain IBAD conditions. The atomi c force microscope (AFM) images indicated that the small-grained, smooth an d continuous film structure of the CeO2 film is more favorable for the in-p lane biaxial texture development than the large-grained and rough structure of the YSZ film. (C) 2000 Elsevier Science S.A. All rights reserved.