Effect of substrate temperature on the surface structure, composition and morphology of indium-tin oxide films

Citation
Cn. De Carvalho et al., Effect of substrate temperature on the surface structure, composition and morphology of indium-tin oxide films, SURF COAT, 124(1), 2000, pp. 70-75
Citations number
13
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
124
Issue
1
Year of publication
2000
Pages
70 - 75
Database
ISI
SICI code
0257-8972(20000201)124:1<70:EOSTOT>2.0.ZU;2-G
Abstract
Surface properties of indium-tin oxide (ITO) films are sensitive to substra te temperature. ITO films have been produced by reactive thermal evaporatio n (RTE) of an indium-tin alloy in the presence of oxygen at different subst rate temperatures. The surface chemical composition and structure of the de posited films have been examined by X-ray photoelectron spectroscopy (XPS). The surface morphology has been investigated by atomic force microscopy (A FM). XPS results indicate that all the examined ITO films contain amorphous and crystalline phases. The best ITO films for optoelectronic applications show the smallest percentage of oxygen and indium atoms in an amorphous ph ase, AFM shows that these films have reduced surface roughness (6.265 nm) a nd grains with almost uniform size and shape. The ITO films deposited on su bstrates in the lower temperature range are darkened and show an increase i n the amount of surface tin associated with a decrease in the amount of ind ium, leading to the formation of the SnO2-rich surfaces. (C) 2000 Elsevier Science S.A. All rights reserved.