THE HYDRODYNAMICAL PLASMON-POLARITON ECHO IN NONUNIFORM SEMICONDUCTORPLASMAS

The temporal plasmon-polariton echo in a semiconductor bounded by a me tal is examined in a hydrodynamic approximation. The studied surface w ave is localized near the semiconductor-metal interface and propagates across the external magnetic field The initial surface-type pulse is modulated by a later applied second one of different wavelength to yie ld the non-vanishing echo signal. The values of the echo generation ti me and of electromagnetic fields of plasma responses are obtained The obtained results may be used in a solid-state surface spectroscopy.