Pd based membranes have the potential to separate hydrogen from gas streams
due to the unique permeation properties of Pd metal to hydrogen. However,
thin films of the metal are required in order,to obtain the necessary flux;
this is usually achieved by deposition onto a porous substrate.
Because of its simplicity and low cost, electroless plating has been used i
n the present work to deposit Pd as a thin film onto a porous alumina subst
rate. Due to non-uniform activation of the substrate surface and/or impurit
ies present in the plating solution, defects occur in the Pd film. These de
fects can be repaired by the technique of electroless plating combined with
osmosis. By this method a membrane with an initial H-2/N-2 permeation rati
o of 10 could be repaired to give an increase of this ratio to approximatel
y 1000. The hydrogen permeation performance-of the resultant membrane was i
nvestigated using pure hydrogen at temperatures from 320 to 577 degrees C.
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