Ferroelectric Sr2Nb2O7 thin films were successfully prepared on Pt/TiO2/SiO
2/Si(100) substrates at temperatures as low as 650 degrees C using a sol-ge
l method with rapid thermal annealing (RTA). It was found that improvements
in film crystallinity and microstructural evolution could be realized by u
sing a RTA process after each coating step. The Sr2Nb2O7 films annealed abo
ve 650 degrees C exhibited an 0k0 preferred orientation. The dielectric con
stant, loss value and remanent polarization of thin films annealed at 700 d
egrees C were 48, 0.01 and 0.5 mu C/cm(2), respectively.