Optimazation of thermal annealing process of lead lanthanum titanate ferroelectric thin films

Rapid thermal annealing (RTA), conventional furnace annealing (CFA) and com bined RTA and CFA annealing (RCA) were adopted for thermal treatment of lea d lanthanum titanate (PLT) thin films. Through comparison of morphologies, dielectric and ferroelectric properties, current-voltage (I-V) and capacita nce-voltage (C-V) characteristics as well as pyroelectric currents, the fea tures of each thermal annealing process were discussed. Optimized thermal a nnealing process was proposed. PLT thin films prepared by RCA process have higher remanent polarization, flat I-V curve, sharper nonlinearity peaks of C - V curve and larger pyroelectric current density.