I. Stolichnov et al., Pt-ion-implantation-induced suppression of leakage conduction in Pt/Pb(ZrxTi1-x)O-3/Pt capacitors, INTEGR FERR, 23(1-4), 1999, pp. 191-198
The effect of 1 MeV ion implantation on leakage conduction, dielectric and
ferroelectric properties of the Pt/Pb(ZrxTi1-x)(2)O-3/Pt capacitors is stud
ied for a wide range of implantation doses (10(10)-10(16) cm(-2)). It is sh
own that the implantation of Pt+, with an implant and vacancy profile peaki
ng at the bottom interface and a dose within the range of 10(13)-10(16) cm(
-2), provokes a strong suppression of the leakage conduction and ferroelect
ric hysteresis. In addition, ion implantation results in a decrease of the
static dielectric constant. Annealing of the specimens at 650 degrees C res
tores the initial conduction and dielectric properties. The phenomena obser
ved can be interpreted in terms of formation of a non-switching dielectric
layer at the interface of the ferroelectric film.
For doses ranging from 10(13) to 10(14) cm(-2) the specimen shows the behav
ior of a linear capacitor with dielectric constant of 120-270 and low level
of leakage currents (about 10(-9) A/cm(2) at de electric field of 150 kV/c
m). The results obtained indicate that ion bombardment of the ferroelectric
film surface can be of practical interest for creation of high dielectric
constant hysteresis-free low-leakage capacitor materials.