Formation and deposition of MoS2-nanoparticles

Citation
H. Keune et al., Formation and deposition of MoS2-nanoparticles, J PHYS IV, 10(P2), 2000, pp. 19-26
Citations number
9
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
10
Issue
P2
Year of publication
2000
Pages
19 - 26
Database
ISI
SICI code
1155-4339(200002)10:P2<19:FADOM>2.0.ZU;2-V
Abstract
An in-situ process is under development to create a dispersed phase of lubr icant MoS2 nanoparticles in a matrix of a hard TiN coating. The particles w ere formed by the reaction system MoCl5/H2S and MoCl5/S-8. According to the requirements of a high temperature TiN CVD process and a low temperature T iN PACVD process, the particle formation at different total and partial pre ssures has been investigated. High yields of particles with diameters of 30 - 50 nm were obtained thermally at temperatures > 300 degrees C and pressu res > 5hPa with MoCl5/H2S as precursors. In the low pressure range particle s were formed by a plasma CVD process using the reaction of elementary sulp hur or H2S with MoCl5. The particles were investigated by laser light scatt ering, electron microscopy, WDX, EDX, TEM, XRD, BET and infrared spectrosco py.