Negative ion production by surface ionization at aluminum-nitride surfaces

Citation
S. Jans et al., Negative ion production by surface ionization at aluminum-nitride surfaces, J APPL PHYS, 87(5), 2000, pp. 2587-2592
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
5
Year of publication
2000
Pages
2587 - 2592
Database
ISI
SICI code
0021-8979(20000301)87:5<2587:NIPBSI>2.0.ZU;2-7
Abstract
In this article, we report on the observation of the formation of negativel y charged ions upon reflection from an aluminum-nitride surface. Positive H -2 and O-2 ions are scattered at small angles of incidence off a single-cry stal surface. Charge exchange at the surface yields neutral particles and n egative ions in the reflected particle flux. The negative ion fractions are about 15% and 1% for oxygen and hydrogen, respectively. The particle refle ction probability is only 2%, which is attributed to the roughness of the s urface. (C) 2000 American Institute of Physics. [S0021-8979(00)08805-8].