Morphology and gas barrier properties of thin SiOx coatings on polycarbonate: Correlations with plasma-enhanced chemical vapor deposition conditions

Citation
Ag. Erlat et al., Morphology and gas barrier properties of thin SiOx coatings on polycarbonate: Correlations with plasma-enhanced chemical vapor deposition conditions, J MATER RES, 15(3), 2000, pp. 704-717
Citations number
50
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
15
Issue
3
Year of publication
2000
Pages
704 - 717
Database
ISI
SICI code
0884-2914(200003)15:3<704:MAGBPO>2.0.ZU;2-R
Abstract
Plasma-enhanced chemical vapor deposition of SiOx coatings on thermoplastic s provides a viable route for production of transparent composite materials with high fracture toughness and high gas barrier properties, which are im portant considerations in the food packaging and biomedical device industri es. By examining several series of systematically varied SiOx/polycarbonate composites, we have identified design correlations between coating charact eristics (thickness, density, surface roughness, and O-2 transmission) and deposition conditions (time, power, pressure, and flow rates). Of particula r interest is the observation that the thermal activation energy for O-2 pe rmeation through these composites increases (by up to 17 kJ/mol) as their b arrier efficacy increases.