T. Nagahama et al., Variation of orientation and morphology of epitaxial SrBi2Ta2O9 and SrBi2Nb2O9 thin films via the coating-pyrolysis process, J MATER RES, 15(3), 2000, pp. 783-792
Orientation-controlled epitaxial thin films of bismuth layer-structured fer
roelectrics, SrBi2Ta2O9 (SBT) and SrBi2Nb2O9 (SBN), were prepared on single
-crystal SrTiO3 (STO) substrates by the coating pyrolysis process. Most of
the SET (SBN) films showed the (106) and (001) orientations on STO(110) and
(001), respectively. The degree of orientation, in terms of the ratio of p
eak intensity to the background level in the x-ray diffraction phi-scan pro
file for the film, greatly increased with a decrease in the oxygen partial
pressure, p(O-2), of annealing atmosphere at 800 degrees C. Interestingly,
coexistence of the (110)-oriented grains with the (106)-oriented ones on ST
O(110) [and the (100)-oriented grains with the (001)-oriented ones on STO(0
01)] was observed exclusively in the SET films annealed at 700-750 degrees
C under p(O-2) of 10 Pa. Atomic force microscopy observations showed that t
he surface morphology of the SET films remained almost unchanged, i.e., com
prising round-shaped grains of submicrometer size, whereas that of the SBN
films drastically changed, according to the variation in orientation of sub
strate surfaces or in annealing conditions, i.e., temperature, p(O-2), and
time.