Citation
Pa. Thiel et Jw. Evans, Nucleation, growth, and relaxation of thin Films: Metal(100) homoepitaxialsystems, J PHYS CH B, 104(8), 2000, pp. 1663-1676
Citations number
89
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY B
ISSN journal
15206106
→ ACNP
Volume
104
Issue
8
Year of publication
2000
Pages
1663 - 1676
Database
ISI
SICI code
1520-6106(20000302)104:8<1663:NGAROT>2.0.ZU;2-X
Abstract
We describe work in our laboratory that has shed new light on nucleation, g
rowth, and relaxation processes in thin metal films. The progress comes fro
m the synergistic and synchronous implementation of theory and experiment,
which reveals surprising secrets hidden a very simple model system.