Decay of an island on a facet via surface diffusion

Citation
M. Uwaha et K. Watanabe, Decay of an island on a facet via surface diffusion, J PHYS JPN, 69(2), 2000, pp. 497-503
Citations number
21
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
ISSN journal
00319015 → ACNP
Volume
69
Issue
2
Year of publication
2000
Pages
497 - 503
Database
ISI
SICI code
0031-9015(200002)69:2<497:DOAIOA>2.0.ZU;2-5
Abstract
We study the decay process of a small island formed on a facet by numerical integration of a simple model and by theoretical analysis. The relaxation proceeds via surface diffusion without evaporation and impingement of atoms . Steps on the top of the island shrink due to the step tension and a small facet appears. The size of the facet increases as the power of time R-f si milar to t(v), where the exponent v depends on the initial shape and the ra te limiting process. In the kinetics-limited case, step bunching occurs fro m the bottom and the enlargement of the facet stops at some stage. Analytic al expressions for the bunch velocity and the island profile are found.