We have observed strong room temperature photoluminescence (PL) from high t
emperature annealed. substoichiometric silicon oxide (SiOx) thin films. pre
pared by plasma enhanced chemical vapor deposition. The PL peaks have been
found in the 650-950 nm spectral range, peak intensities increase with the
annealing temperature up to 1250 degrees C. A marked redshift of the lumine
scence peaks has been observed by increasing the Si concentration of the Si
Ox films as well as the annealing temperature. Transmission electron micros
copy analyses have demonstrated that Si nanocrystals (nc), having mean radi
us ranging between 0.7 and 2.1 nm, are present in the annealed samples, and
that their size increases with increasing the Si content and the annealing
temperature. Structural and optical data have been related and discussed i
n terms of quantum carrier confinement. (C) 2000 Elsevier Science S.A. All
rights reserved.