Effect of substrate temperature on the structural, electrical and optical properties of ITO films prepared by RF magnetron sputtering

Polycrystalline indium tin oxide (ITO) thin films were prepared on glass su bstrates using rf magnetron sputtering from ITO target. The as-deposited fi lms were studied as a function of substrate temperature T-s using X-ray dif fraction (XRD), electrical and optical measurements. In the range 150 degre es C less than or equal to T-s less than or equal to 250 degrees C XRD show s the coexistence of the (100) and (111) textures. The results of electrica l and Structural measurements suggest that the donor impurities are due to the substitution of:Sn into Tn sites, which causes an expansion of the latt ice. The resistivity was found to decrease with T-s up to 250 degrees C. Th e quality of the films as transparent conducting layers, for solar cell app lications, was investigated.