Photon stimulated desorption of H+ from hydrogenated GaAs (110) and (100) s
urfaces was studied as a function of photon energy. Distinct peaks, observe
d around As 3d core-level binding energy for desorption from the GaAs (100)
surface and in the As 3d and Ga 3p region for desorption from the GaAs (11
0) surface, show a striking similarity with the fine structure (spin-orbit
splitting) measured in the photoemission from As 3d and Ga 3p levels. These
results provide clear evidence for direct desorption processes and represe
nt a basis for selective modification of hydrogenated GaAs surfaces.