Av. Blant et al., Nitrogen species from radio frequency plasma sources used for molecular beam epitaxy growth of GaN, PLASMA SOUR, 9(1), 2000, pp. 12-17
We have made a detailed study of the: optical spectroscopy of two different
RF plasma sources used for the growth of GaN by molecular beam epitaxy. Ou
r studies show that for both sources the predominant species present in the
cavity are nitrogen atoms. The strongest optical emission occurs at 869 nm
. We have also studied, in detail, the factors which influence the ion cont
ent of the flux. Two key parameters are the temperature of the wall of the
cavity and the size of the holes in the aperture plate from which the speci
es emerge into the vacuum. We have identified conditions under which the io
n content can be made negligibly small and show that this results in films
with improved optical properties.