Nitrogen species from radio frequency plasma sources used for molecular beam epitaxy growth of GaN

Citation
Av. Blant et al., Nitrogen species from radio frequency plasma sources used for molecular beam epitaxy growth of GaN, PLASMA SOUR, 9(1), 2000, pp. 12-17
Citations number
21
Categorie Soggetti
Physics
Journal title
PLASMA SOURCES SCIENCE & TECHNOLOGY
ISSN journal
09630252 → ACNP
Volume
9
Issue
1
Year of publication
2000
Pages
12 - 17
Database
ISI
SICI code
0963-0252(200002)9:1<12:NSFRFP>2.0.ZU;2-Y
Abstract
We have made a detailed study of the: optical spectroscopy of two different RF plasma sources used for the growth of GaN by molecular beam epitaxy. Ou r studies show that for both sources the predominant species present in the cavity are nitrogen atoms. The strongest optical emission occurs at 869 nm . We have also studied, in detail, the factors which influence the ion cont ent of the flux. Two key parameters are the temperature of the wall of the cavity and the size of the holes in the aperture plate from which the speci es emerge into the vacuum. We have identified conditions under which the io n content can be made negligibly small and show that this results in films with improved optical properties.