As the demand for flip-chip products increases, the need for low cost high
volume manufacturing processes also increases. Currently solder paste print
ing is the wafer bumping method of choice for device pitches down to 150-20
0 mu m. However, limitations in print quality and stencil manufacture mean
that this technology is not likely to move significantly below this pitch a
nd new methods will be required to meet the demands predicted by the techno
logy roadmaps. This paper describes experiments conducted on carriers made
from silicon for bumping of die using solder paste. An anisotropic etching
process was used to generate pockets in the silicon surface into which sold
er paste was printed. Die were then placed against the carrier and reflowed
to transfer the solder directly to the bondpads. An assessment was carried
out of the potential application and limitations of this technique for dev
ice pitches at 225 and 127 mu m.