Damage study of ITO under high electric field

Citation
J. He et al., Damage study of ITO under high electric field, THIN SOL FI, 363(1-2), 2000, pp. 240-243
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
363
Issue
1-2
Year of publication
2000
Pages
240 - 243
Database
ISI
SICI code
0040-6090(20000301)363:1-2<240:DSOIUH>2.0.ZU;2-W
Abstract
Photoetching was used to obtain a narrow gap (about 10 mu m) on a slip of i ndium tin oxide (ITO) which was coated on a glass plate. A high electrical field (about 10(6) V/cm) was applied between the two sides of the gap, so a s to study the characteristics of ITO. Under this field, there is an interm ittent current between two sides of the gap. We found that ITO decomposed, became opaque and its surface became Very rough. The atomic concentrations of In and Sn in the dark region were higher than those in the original ITO slip. The resistance of the ITO slip increased accordingly. There were some gases, such as oxygen, carbon dioxide (or nitrogen), carbon monoxide, whic h evolved from the surface when ITO decomposed. After quick annealing under an oxygen atmosphere, the sample became as transparent as the original ITO . These observations show that ITO decomposes under a high electric field. (C) 2000 Elsevier Science S.A. All rights reserved.