X-ray excited optical luminescence (XEOL): a potential tool for OELD studies

Citation
Tk. Sham et al., X-ray excited optical luminescence (XEOL): a potential tool for OELD studies, THIN SOL FI, 363(1-2), 2000, pp. 318-321
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
363
Issue
1-2
Year of publication
2000
Pages
318 - 321
Database
ISI
SICI code
0040-6090(20000301)363:1-2<318:XEOL(A>2.0.ZU;2-N
Abstract
An X-ray excited optical luminescence (XEOL) technique using laboratory sof t X-rays and synchrotron radiation in the visible-UV and soft X-ray region will be discussed. It is shown that XEOL takes advantage of the penetration power of the X-rays and the tunability of the photons from a synchrotron s ource. Thus XEOL provides some sampling depth and site selectivity and allo ws for the probing of underlayers and buried interfaces. XEOL studies of po rous silicon and a poly-vinyl-carbazole film will be used to illustrate tha t this technique is suited for the study of organic luminescent materials a nd organic electroluminescence devices (OELD). (C) 2000 Elsevier Science S. A. All rights reserved.