Novel design of carbon-rich polymers for 193 nm microlithography: Adamantane-containing cyclopolymers

For 193 mm lithographic applications robust polymers containing a high carb on/hydrogen ratio are required. In this paper a novel cyclopolymerization a pproach is presented for producing chemically amplified resists that are tr ansparent at the imaging wavelength. Upon exposure to a 193 nm laser steppe r, features 160 nm in size can readily be obtained (see Fig.).