Low-voltage GaN : Er green electroluminescent devices

Citation
J. Heikenfeld et al., Low-voltage GaN : Er green electroluminescent devices, APPL PHYS L, 76(11), 2000, pp. 1365-1367
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
11
Year of publication
2000
Pages
1365 - 1367
Database
ISI
SICI code
0003-6951(20000313)76:11<1365:LG:EGE>2.0.ZU;2-L
Abstract
Green light emission has been measured from Er-doped GaN electroluminescent devices (ELDs) at an applied bias as low as 5 V. The GaN-Er ELDs were grow n by solid source molecular beam epitaxy on Si (111) substrates. We have ac hieved this low-voltage operation (ten-fold reduction in optical turn-on vo ltage) by using heavily doped (similar to 0.01 Omega cm) Si substrates and by decreasing the GaN-Er layer thickness to several hundred nanometers. A s imple device model is presented for the indium tin oxide/GaN-Er/Si/Al ELD. This work demonstrates the voltage excitation efficiency of Er3+ luminescen t centers and the compatibility of GaN rare earth-doped ELDs with low-volta ge drive circuitry. (C) 2000 American Institute of Physics. [S0003- 6951(00 )01511-4].