Yq. Fu et al., Characterization and tribological evaluation of duplex treatment by depositing carbon nitride films on plasma nitrided Ti-6Al-4V, J MATER SCI, 35(9), 2000, pp. 2215-2227
Carbon nitride (CNX) films (with N/C ratio of 0.5) were deposited on both u
ntreated and plasma nitrided Ti-6Al-4V substrates by D.C. magnetron sputter
ing using a graphite target in nitrogen plasma. TEM and XPS analysis reveal
ed the formation of both amorphous CNX structure and crystalline beta-C3N4
phases in the deposited coatings. Nano-indentation tests showed that the fi
lm hardness was about 18.36 GPa. Both the scratch tests and indentation tes
ts showed that compared with CNX film deposited directly on Ti-6Al-4V, the
load bearing capacity of CNX film deposited on plasma nitrided Ti-6Al-4V wa
s improved dramatically. Ball-on-disk wear tests under both dry sliding and
lubricated conditions (with simulated body fluids) were performed to evalu
ate the friction and wear characteristics of the deposited coatings. Result
s showed that under both dry and lubricated conditions, the duplex treated
system (i.e., with CNX film deposited on plasma nitrided Ti-6Al-4V substrat
e) was more effective in maintaining a favorable low and stable coefficient
of friction and improving wear resistance than both individual plasma nitr
iding and CNX films on Ti-6Al-4V substrate. Under dry sliding conditions, t
he generated wear debris of spalled films were accumulated on the wear trac
k, mechanically alloyed and graphitized, thus significantly reducing the co
efficient of friction and preventing wear of the substrate. However, under
lubricated conditions, due to the flowing of the fluids, the lubricating we
ar debris was taken away by the fluids, and therefore, the direct contact o
f two original surfaces resulted in high coefficient of friction and extens
ive abrasive wear of the substrate for CNX films deposited on Ti-6Al-4V sub
strate. Also when there was some small-area spallation of CNX films, the fl
uids could seep into the interface between the film and substrate, thus deg
rading the interfacial adhesion and resulting in a large area spallation. (
C) 2000 Kluwer Academic Publishers.