Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H-2/SiH4 RF discharges

Authors
Citation
M. Hertl et J. Jolly, Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H-2/SiH4 RF discharges, J PHYS D, 33(4), 2000, pp. 381-388
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
33
Issue
4
Year of publication
2000
Pages
381 - 388
Database
ISI
SICI code
0022-3727(20000221)33:4<381:LFDAKO>2.0.ZU;2-T