Thermal conductivity of beta-Si3N4: I, effects of various microstructural factors

Citation
M. Kitayama et al., Thermal conductivity of beta-Si3N4: I, effects of various microstructural factors, J AM CERAM, 82(11), 1999, pp. 3105-3112
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
ISSN journal
00027820 → ACNP
Volume
82
Issue
11
Year of publication
1999
Pages
3105 - 3112
Database
ISI
SICI code
0002-7820(199911)82:11<3105:TCOBIE>2.0.ZU;2-N
Abstract
Calculations based on a simple modified Wiener's model for thermal conducti vity of a composite material predict that the thermal conductivity of beta- Si3N4 decreases quickly as the grain-boundary film thickness increases with in a range of a few tenths of a nanometer and also that it initially increa ses steeply with increased grain size, then reaches almost constant values. Because of the faceted nature of the beta-Si3N4 crystal, the "average" gra in-boundary film thickness is much greater than that in equilibrium. The pr esent study demonstrates both theoretically and experimentally that grain g rowth alone cannot improve the thermal conductivity of beta-Si3N4.