Effective method for evaluation of semiconductor laser quality

Citation
Hy. Li et al., Effective method for evaluation of semiconductor laser quality, MICROEL REL, 40(2), 2000, pp. 333-337
Citations number
5
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
40
Issue
2
Year of publication
2000
Pages
333 - 337
Database
ISI
SICI code
0026-2714(200002)40:2<333:EMFEOS>2.0.ZU;2-2
Abstract
The measurements of one hundred 1.3 mu m planar buried crescent (PBC) struc ture InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semicond uctor lasers effectual. By measurement of electrical derivative curves one can evaluate the quality of epitaxial wafer and chip, find the problems in the material and the technology, offer the useful information on increasing the quality and improving the technology of devices. (C) 2000 Elsevier Sci ence Ltd. All rights reserved.