Structural analysis of Fe/Ni(001) films by photoelectron diffraction

The structure of Fe films, epitaxially grown on Ni(001), has been studied i n the 0-14 ML coverage range by means of photoelectron diffraction (PD) in the forward scattering regime. Quantitative analysis by a multiple scatteri ng approach has been performed on Fe films at a coverage of 3 and 7 ML. Ana lysis of the 3-ML data showed that growth was not layer-by-layer but rather occurred through islands nucleation and that transition from the pseudomor phic fee to the bcc phase was located in this early stage of growth. In fac t, best fit was obtained by calculations on a 2 ML bcc(110)/3 ML fcc(001) F e film with the bcc[111]parallel to fcc[110] in-plane orientation. Interlay er spacings of 2.05 +/- 0.068 Angstrom, 2.01 +/- 0.03 Angstrom, and 1.85 +/ - 0.03 Angstrom were found in the bcc region, between bcc and fee layers an d in the fee region, respectively. Best-fit in-plane nearest-neighbors (n-n ) distance was 2.49 +/- 0.02 Angstrom, in registry with that of the Ni subs trate. To analyze the 7-ML data a 4 ML bcc(110)/3 ML fcc(001) film was empl oyed, varying the fitting parameters in the bcc region only. Best fit was o btained for an interlayer spacing of 2.04 +/- 0.04 Angstrom and in plane n- n distance of 2.47 +/- 0.01 Angstrom. At 14 ML the PD pattern collected ove r a 94 degrees azimuthal range displayed symmetry around the [110] substrat e direction, which was explained by the equipopulation of the 4 bcc(110) do mains satisfying the bcc[111]parallel to fcc[110] alignment.