Electroluminescence in MOS structures with Si/SiO2 nanometric multilayers

Citation
Z. Gaburro et al., Electroluminescence in MOS structures with Si/SiO2 nanometric multilayers, SOL ST COMM, 114(1), 2000, pp. 33-37
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
114
Issue
1
Year of publication
2000
Pages
33 - 37
Database
ISI
SICI code
0038-1098(2000)114:1<33:EIMSWS>2.0.ZU;2-6
Abstract
Silicon light emitting devices, compatible with the conventional CMOS proce ss, have been fabricated and tested. The structure of the devices is based on a MOS capacitor where nanometer thick silicon/silicon dioxide multilayer s have been grown in the dielectric. Room temperature photo- and electrolum inescence were measured. While photoluminescence has been recognized as bei ng due to electron-hole recombination in the nanometer thick silicon layers , electroluminescence was mainly related to hot-electron relaxation in the substrate. The measured external quantum efficiency of the electroluminesce nce is about 5 x 10(-5). (C) 2000 Elsevier Science Ltd. All rights reserved .