LOW-THRESHOLD 840-NM LATERALLY OXIDIZED VERTICAL-CAVITY LASERS USING ALINGAAS-ALGAAS STRAINED ACTIVE LAYERS

Citation
J. Ko et al., LOW-THRESHOLD 840-NM LATERALLY OXIDIZED VERTICAL-CAVITY LASERS USING ALINGAAS-ALGAAS STRAINED ACTIVE LAYERS, IEEE photonics technology letters, 9(7), 1997, pp. 863-865
Citations number
18
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
9
Issue
7
Year of publication
1997
Pages
863 - 865
Database
ISI
SICI code
1041-1135(1997)9:7<863:L8LOVL>2.0.ZU;2-2
Abstract
We explore the use of a novel strained AlInGaAs-AlGaAs material system to achieve low-threshold current in oxide-apertured vertical-cavity l asers (VCL's) emitting near 850 nm, We report a low continuous-wave (C W) room-temperature threshold current of 290 mu A from top-emitting, 8 40-nm VCL's with a 5-mu m-wide thin-oxide aperture, The low-threshold current has been attributed to the use of strained active layers, whic h increase the gain and reduce the transparency current, We also studi ed the effects of postgrowth rapid thermal annealing (RTA) on the char acteristics of AlInGaAs-AlGaAs VCL's and found that RTA improves the m aterial quality and significantly enhances VCL performance.