Photopatterning of a monomolecular dye film by means of scanning near-field optical microscopy

Authors
Naber, A Dziomba, T Fischer, UC Maas, HJ Fuchs, H
Citation
A. Naber et al., Photopatterning of a monomolecular dye film by means of scanning near-field optical microscopy, APPL PHYS A, 70(2), 2000, pp. 227-230
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
70
Issue
2
Year of publication
2000
Pages
227 - 230
Database
ISI
SICI code
0947-8396(200002)70:2<227:POAMDF>2.0.ZU;2-9
Abstract
Patterned bleaching of a photolabile monomolecular dye film by means of sca nning near-field optical microscopy (SNOM) is demonstrated. After exposure, the written patterns were verified by SNOM with fluorescence detection. Th e adsorption of appropriate material to such near-field optically created p atterns seems now feasible. The ultimate resolution limit of a monomolecula r dye film for patterned bleaching by SNOM is discussed on the basis of a s imple model.