Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient

The effect of a magnetic field on the plasma composition of a pulsed Au pla sma stream in a high-vacuum ambient is described. The plasma was formed wit h a pulsed vacuum-arc-plasma source, and the time-resolved plasma compositi on was measured with time-of-flight charge-to-mass spectrometry. Plasma imp urities due to ionization of nonmetallic species (H+, O+, and N+) were foun d to be below the detection limit in the absence of a magnetic field. Howev er, in the presence of a magnetic field (0.4 T), the contribution of ionize d nonmetal species to the plasma composition was up to 0.22 atomic ratio. T hese results are characteristic of plasma-based techniques where magnetic f ields are employed in a high-vacuum ambient. In effect, the impurity incorp oration during thin-film growth pertains to the present findings. (C) 2000 American Institute of Physics. [S0003-6951(00)00712-9].