Electron emission from thin-film ferroelectric cathodes

Citation
F. Liu et Cb. Fleddermann, Electron emission from thin-film ferroelectric cathodes, APPL PHYS L, 76(12), 2000, pp. 1618-1620
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
12
Year of publication
2000
Pages
1618 - 1620
Database
ISI
SICI code
0003-6951(20000320)76:12<1618:EEFTFC>2.0.ZU;2-V
Abstract
Electron emission from thin-film (< 1 mu m thick) ferroelectric cathodes ha s been investigated. The cathodes were made using sol-gel deposition and st andard microelectronic patterning techniques and were excited using either dc or pulsed bias. Repeatable emission current densities up to 10 mu A/cm(2 ) were measured from 0.8-mu m-thick lead-niobium-zirconium-titanate cathode s driven in the pulsed mode with switch voltages up to 22 V. Intermittent e mission up to 20 mA/cm(2) was measured for higher switch voltages. The depe ndence of emission current on switch voltage, grid dimensions, and extracti on voltage will be presented. (C) 2000 American Institute of Physics. [S000 3-6951(00)01311-5].