FABRICATION OF CR NANOSTRUCTURES WITH THE SCANNING TUNNELING MICROSCOPE

In this work, nanometer scale electrically conducting lines and quantu m structures on chromium (Cr) films have been fabricated with an ambie nt scanning tunnelling microscope and a subsequent CR-14 chromium etch . The line width of these structures is approximately 60 nm and the he ight of the lines is approximately 10 nm. In addition, experiments hav e been performed to determine the Cr etch rate in CR-14 etchant and th e thickness of the Cr layer that could be oxidized through by the STM tunnelling current.