Critical point and vapor pressure measurements at high temperatures by means of a new apparatus with ultralow residence times

Citation
Dm. Vonniederhausern et al., Critical point and vapor pressure measurements at high temperatures by means of a new apparatus with ultralow residence times, J CHEM EN D, 45(2), 2000, pp. 157-160
Citations number
8
Categorie Soggetti
Chemistry,"Chemical Engineering
Journal title
JOURNAL OF CHEMICAL AND ENGINEERING DATA
ISSN journal
00219568 → ACNP
Volume
45
Issue
2
Year of publication
2000
Pages
157 - 160
Database
ISI
SICI code
0021-9568(200003/04)45:2<157:CPAVPM>2.0.ZU;2-X
Abstract
A new flow method has been employed to obtain critical point and vapor pres sure data at high temperatures for four compounds: squalane, toluene, ethyl benzene, and styrene. This new flow method allows the determination of reli able critical points and vapor pressures for thermally unstable or otherwis e reactive compounds. The critical point is inferred from other measurement s in the critical region. The measurement accuracy is less than that obtain ed by more conventional methods, but this method has been used where conven tional methods fail.