Microscopic photoluminescence evaluation of bright spots in Fe-doped InP wafers

Citation
M. Wakahara et al., Microscopic photoluminescence evaluation of bright spots in Fe-doped InP wafers, J CRYST GR, 210(1-3), 2000, pp. 226-229
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
210
Issue
1-3
Year of publication
2000
Pages
226 - 229
Database
ISI
SICI code
0022-0248(200003)210:1-3<226:MPEOBS>2.0.ZU;2-E
Abstract
Microscopic non-uniformity of Fe-doped semi-insulating InP wafers has been investigated by photoluminescence spectroscopy and mapping. A deep-level em ission with a peak around 1.1 eV appears at 15 K in addition to the band-ed ge emission due to the exciton recombination at 1.42 eV. An intensity ratio of the 1.1 eV band to the 1.42 eV band is correlated positively with the F e concentration, suggesting that the 1.1 eV band is associated with Fe. The intensity of the 1.1 eV band decreases at bright spots and lines with an o pposite intensity in contrast to the band-edge emission. This gives strong evidence for the idea that the origin of the bright spot and line is an Fe- depleted region where Fe is gettered by defects, most probably dislocations , through their strain field. (C) 2000 Elsevier Science B.V. All rights res erved.