Influence of substrates on magnetic property and crystalline orientation of CoCrTa/TiCr perpendicular magnetic recording medium

Citation
T. Asahi et al., Influence of substrates on magnetic property and crystalline orientation of CoCrTa/TiCr perpendicular magnetic recording medium, J MAGN MAGN, 212(1-2), 2000, pp. 293-299
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
212
Issue
1-2
Year of publication
2000
Pages
293 - 299
Database
ISI
SICI code
0304-8853(200003)212:1-2<293:IOSOMP>2.0.ZU;2-C
Abstract
The influence of substrates on magnetic property and crystalline orientatio n of CoCrTa/TiCr perpendicular magnetic recording medium was investigated u sing a glass plate and a Si(1 0 0) single crystal. Magnetic measurements re vealed that the film sputtered on a Si(1 0 0) substrate possessed a higher perpendicular coercive force than that on glass, where the pretreatment of the Si(1 0 0) substrate by aqueous HF solution effectively improved the mag netic properties. X-ray diffraction analysis of the films indicated that th e crystallinity of the TiCr layer formed on the Si(1 0 0) substrate with th e HF pretreatment was higher than that on the glass substrate. It was also found that CoCrTa and TiCr layers on the Si(1 0 0) substrate with the KF pr etreatment had a narrower distribution of their c-axis orientation than tho se on glass substrate. The results of X-ray diffraction analysis were consi stent with those of the TEM observation for cross-section bright- and dark- field images and the corresponding THEED patterns. These results suggest th at the crystalline surface of the Si(1 0 0) substrate with HF pretreatment has the effect of inducing preferred orientation in the TiCr underlayer, wh ich leads to a decrease in distribution of the c-axis orientation of Co gra ins in the CoCrTa layer, resulting in an increase in the perpendicular coer cive force. (C) 2000 Elsevier Science B.V. All rights reserved.