From random sequential adsorption to ballistic deposition: A general view of irreversible deposition processes

Citation
P. Schaaf et al., From random sequential adsorption to ballistic deposition: A general view of irreversible deposition processes, J PHYS CH B, 104(10), 2000, pp. 2204-2214
Citations number
83
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY B
ISSN journal
15206106 → ACNP
Volume
104
Issue
10
Year of publication
2000
Pages
2204 - 2214
Database
ISI
SICI code
1520-6106(20000316)104:10<2204:FRSATB>2.0.ZU;2-P
Abstract
Irreversible adsorption/deposition processes are defined as processes in wh ich, once adsorbed, the particles can neither desorb from nor diffuse along the surface. These processes are commonly encountered when macromolecules or colloidal particles deposit on solid surfaces. This article presents a g eneral and unified picture of these processes based mainly on experimental, simulation, and theoretical results accumulated by the authors over recent years. We describe first the influence of surface exclusion effects on the adsorption process under negligible influence of gravity. Essential result s relative to the random sequential adsorption (RSA) model are given, The i nfluence of particle diffusion and hydrodynamic interactions during the ads orption process in the deposition zone near the deposition plane on the str ucture of the assembly of deposited particles and on the adsorption kinetic s are analyzed. It is shown that hydrodynamic interactions have the tendenc y to randomize the position of the particles over the available surface and thus to render the adsorption process RSA-like. Model predictions are conf irmed by experimental data. For the deposition of larger particles gravity plays an important role, and the deposition process is characterized by a d imensionless particle radius R* The case of an infinite value of R* is firs t discussed and the ballistic deposition (BD) model is described. The depos ition processes characterized by R* values ranging from 0.6 to 3.3 are then analyzed. For such R* values one observes a smooth transition from the RSA to the ED behavior when R* is increased.