Inter-edge-mode scattering in a high-mobility strained silicon two-dimensional electron system

Citation
N. Griffin et al., Inter-edge-mode scattering in a high-mobility strained silicon two-dimensional electron system, J PHYS-COND, 12(8), 2000, pp. 1811-1818
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
12
Issue
8
Year of publication
2000
Pages
1811 - 1818
Database
ISI
SICI code
0953-8984(20000228)12:8<1811:ISIAHS>2.0.ZU;2-W
Abstract
The magnetoresistances of two-dimensional electron systems in strained sili con on a relaxed silicon-germanium buffer have been measured at low tempera tures (50 mK). Samples, with Hall mobilities up to 3.61 x 10(5) cm(2) V-1 s (-1),have shown a marked asymmetry between adjacent Shubnikov-de Haas peaks and a prominent overshoot on the low-field side of the odd-filling-factor quantum Hall plateaux. This effect persisted to unusually small magnetic fi elds. It is argued that both of these phenomena can be explained by a stron g back-scattering of multiple edge modes which is suppressed at integer fil ling factors.