Copper corrosion mechanism in the presence of formic acid vapor for short exposure times

Citation
Jm. Bastidas et al., Copper corrosion mechanism in the presence of formic acid vapor for short exposure times, J ELCHEM SO, 147(3), 2000, pp. 999-1005
Citations number
20
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
147
Issue
3
Year of publication
2000
Pages
999 - 1005
Database
ISI
SICI code
0013-4651(200003)147:3<999:CCMITP>2.0.ZU;2-M
Abstract
The rate of copper corrosion originated by the action of formic acid vapors at 100% relative humidity was studied. Five formic vapor concentration lev els (10, 50, 100, 200, and 300 ppm) were used. A copper corrosion rate of u p to 1300 mg/m(2) d was measured for a period of 21 days using a gravimetri c method. The patina layers were characterized using cathodic reduction, X- ray powder diffraction, Fourier transform infrared spectrometry, and scanni ng electron microscopy techniques. Some of the components identified in the corrosion-product layers were cuprite (Cu2O), cupric hydroxide hydrate [Cu (OH)(2). H2O], and copper formate hydrate [Cu(HCOO)(2). 4H(2)O]. The latter was formed by both cupric hydroxide and formic acid-cuprous ion complex me chanisms. (C) 2000 The Electrochemical Society. S0013-4651(99)03-061-X. All rights reserved.