Polycrystalline CeO2 with a relative density in excess of 97% was prepared.
The specimens contained a lower concentration of impurities than those exa
mined previously. Oxygen diffusion experiments were performed for the tempe
rature range from 800 to 1300 degrees C, in an oxygen partial pressure of 6
.6 x 10(3) Pa. The concentration profile of O-18 in the specimens following
diffusion annealing was measured by secondary ion mass spectroscopy (SIMS)
. In the high-temperature region (intrinsic region, above 1000 degrees C),
the oxygen self-diffusion coefficient obtained using SIMS was observed to a
gree reasonably with that obtained by phase analysis in a previous study, b
ut the activation energy was found to be slightly smaller. The present resu
lt, D = 3.16 x 10(-4) (T = 1100-1300 degrees C), is thought to represent th
e intrinsic behavior of undoped CeO2. In contrast, exp(-226 kJ mol(-1)/RT)
m(2) s(-1) in the low temperature region (extrinsic region, less than 1000
degrees C), the activation energy was smaller than that in the high tempera
ture region. Comparison wit with data reported in the literature for CeO2 d
oped with Y and Gd, suggests that the low-temperature oxygen diffusion regi
on is controlled by a trivalent impurity The surface exchange coefficients
obtained from gas phase analysis and SIMS agreed very well with each other
and were represented by k = 1.93 X 10(-3) exp(- 136 kJ mol(-1)/RT) m s (-1)
(T = 800-1300 degrees C). The data were also in good agreement with the su
rface exchange coefficient in ThO2, suggesting that thr. oxygen surface exc
hange reaction is insensitive to cation species. (C) 2000 The Electrochemic
al Society.