Photoemission studies of K-promoted oxidation of the GaAs(110) surface

Citation
G. Lin et al., Photoemission studies of K-promoted oxidation of the GaAs(110) surface, J VAC SCI A, 18(2), 2000, pp. 325-328
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
2
Year of publication
2000
Pages
325 - 328
Database
ISI
SICI code
0734-2101(200003/04)18:2<325:PSOKOO>2.0.ZU;2-#
Abstract
Core-level and valence-band photoemission have been used to investigate oxi dation at the K/GaAs(100) interface. The results show that potassium deposi ted on the top of a substrate forms a polarized layer. The K-promoted oxida tion mainly involves As. The initial bonds between an alkali metal and a se miconductor have less of a relation with the amount of adsorbed oxygen, but the disruption of K-As bonds restores a large density of As dangling bonds , and the adsorbed oxygen coupling of these dangling bonds leads to the out -of-proportional function of the As oxide. (C) 2000 American Vacuum Society . [S0734-2101(00)01402-0].